Txhawm rau ua kom tau raws li qhov xav tau ntawm cov tuam txhab nti tseem ceeb, ob pawg ntawm 8.9 tons ntawm photoresist tuaj txog hauv Shanghai

Raws li kev tshaj tawm xov xwm CCTV13, CK262 tag nrho cov khoom thauj ntawm Tuam Tshoj Cargo Airlines, lub chaw haujlwm ntawm Tuam Tshoj Eastern Airlines, tuaj txog ntawm tshav dav hlau Shanghai Pudong thaum Lub Plaub Hlis 24, nqa 5.4 tons ntawm photoresist.

Nws tau tshaj tawm tias vim muaj kev cuam tshuam ntawm kev sib kis thiab kev thauj mus los siab, cov tuam txhab chip ib zaug tsis tuaj yeem nrhiav lub davhlau tsim nyog xa cov photoresist xav tau rau Shanghai.

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Raws li kev sib koom tes ntawm Shanghai Municipal Commission of Transportation, Tuam Tshoj Eastern Logistics tau tsim ib pab neeg tshwj xeeb aviation logistics txhawb nqa kev thauj mus los los muab cov txheej txheem logistics tag nrho suav nrog kev thauj mus los hauv huab cua thiab
ceev kev lis kev cai clearance.Lub Plaub Hlis 20 thiab Lub Plaub Hlis 24, qhov project tau ua tiav tiav.Ob pawg ntawm photoresist nrog tag nrho ntawm 8.9 tons ntawm photoresist tau thauj los ntawm huab cua los daws cov kev xav tau txuas ntxiv ntawm cov saw hlau ntawm cov tuam txhab chip tseem ceeb.

Lus Cim: Photoresist yog hais txog kev tiv thaiv etching zaj duab xis cov ntaub ntawv uas nws solubility hloov pauv los ntawm irradiation los yog hluav taws xob ntawm ultraviolet lub teeb, electron beam, ion beam, X-ray, thiab lwm yam. semiconductor discrete devices.

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Lub sij hawm xa tuaj: Plaub Hlis-25-2022